Academic Areas: Measurement theory and method of layered nanomaterials; innovative development and application of ellipsometer; modeling and optimization design of optical devices
Born in September 1970, Professor Liu is a doctoral supervisor of HUST, member of ICMI, OSA, AVS, SPIE, IEEE and member of the Professional Committee of Optical testing of Chinese Optical Society, member of Professional Committee of Measuring Instruments of Chinese Society for Measurement, and Vice President of Hubei Instrument and Control Society.
1.X.Chen, W. Du, K. Yuan, J. Chen, H. Jiang, C. Zhang, and S. Liu, "Development of a spectroscopic Mueller matrix imaging ellipsometer for nanostructure metrology," Rev. Sci. Instrum. 87(5), 053707 (2016).
2.H.Gu, X. Chen, H. Jiang, C. Zhang, W. Li, and S. Liu, "Accurate alignment of optical axes of a biplate using a spectroscopic Mueller matrix ellipsometer," Appl. Opt. 55(15), 3935-3941 (2016).
3.W.Li, H. Jiang, C. Zhang, X. Chen, H. Gu, and S. Liu,"Characterization of curved surface layer by Mueller matrix ellipsometry,” J. Vac. Sci. Technol. B 34(2), 020602 (2016).
4.W.Li, C. Zhang, H. Jiang, X. Chen, and S. Liu, "Depolarization artifacts in dual rotating compensator Mueller matrix ellipsometry," J. Opt.18(5), 055701 (2016).
5.H.Gu, X. Chen, H. Jiang, C. Zhang, and S. Liu, "Optimal broadband Mueller matrix ellipsometer using multi-waveplates with flexibly oriented axes," J. Opt. 18(2), 025702 (2016).
6.J.Zhu, H. Jiang, Y. Shi, X. Chen, C. Zhang, and S. Liu, "Improved nanostructure reconstruction by performing data refinement in optical scatterometry," J. Opt. 18(1), 015605 (2016).
7.X.Chen, H. Jiang, C. Zhang, and S. Liu, "Towards understanding the detection of profile asymmetry from Mueller matrix differential decomposition," J.Appl. Phys. 118(22), 225308 (2015).
8.S. Liu,W. Du, X. Chen, H. Jiang, and C. Zhang, "Mueller matrix imaging ellipsometry for nanostructure metrology," Opt. Express 23(13), 17316-17329(2015).
9.S. Liu,X. Chen, and C. Zhang, "Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology,"Thin Solid Films 584, 176-185 (2015).
10.J.Zhu, S. Liu,H. Jiang, C. Zhang, and X. Chen, "Improved deep-etched multilayer grating reconstruction by considering etching anisotropy and abnormal errors in optical scatterometry," Opt. Lett. 40(4), 471-474 (2015).
11.J.Zhu, H. Jiang, Y. Shi, C. Zhang, X. Chen, and S. Liu, "Fast and accurate solution of inverse problem in optical scatterometry using heuristic search and robust correction," J.Vac. Sci. Technol. B 33(3), 031807 (2015).
12.H.Gu, S. Liu,X. Chen, and C. Zhang, "Calibration of misalignment errors in composite waveplates using Mueller matrix ellipsometry," Appl. Opt. 54(4), 684-693 (2015).
13.X.Wu, S. Liu,W. Lv, and E. Y. Lam, "Sparse nonlinear inverse imaging for shot countreduction in inverse lithography," Opt.Express 23(21), 26919-26931(2015).
14.X.Chen, C. Zhang, S. Liu,H. Jiang, Z. Ma, and Z. Xu, "Mueller matrix ellipsometric detection ofprofile asymmetry in nanoimprinted grating structures," J. Appl. Phys. 116(19), 194305 (2014).
15.J.Zhu, S. Liu,X. Chen, C. Zhang, and H. Jiang, "Robust solution to the inverse problem in optical scatterometry," Opt.Express 22(18), 22031-22042(2014).
16.X.Chen, S. Liu,C. Zhang, H. Jiang, Z. Ma, T. Sun, and Z. Xu, "Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry," Opt. Express 22(12), 15165-15177 (2014).
17.S.Xu, C. Zhang, H. Wei, and S. Liu,"A single-image method of aberration retrieval for imaging systems under partially coherent illumination,"J.Opt. 16(7), 072001 (2014).
18.X.Chen, S. Liu,H. Gu, and C. Zhang, "Formulation of error propagation and estimation ingrating reconstruction by a dual-rotating compensator Mueller matrix polarimeter,"Thin Solid Films 571, 653-659 (2014).
19.Z.Dong, S. Liu,X. Chen, and C. Zhang, "Determination of an optimal measurement configuration in optical scatterometry using global sensitivity analysis,"Thin Solid Films 562, 16-23 (2014).
20.W.Lv, E. Y. Lam, H. Wei, and S. Liu,"Cascadic multigrid algorithm for robust inverse mask synthesis in optical lithography," J. Micro/Nanolith.MEMS MOEMS 13(2), 023003 (2014).
21.W.Lv, S. Liu,X. Wu, and E. Y. Lam, "Illumination source optimization in optical lithography via derivative-free optimization," J. Opt. Soc. Am. A 31(12), B19-B26 (2014).
22.X.Zhou, C. Zhang, H. Jiang, H. Wei, and S. Liu, "Efficient representation of mask transmittance functions for vectorial lithography simulations," J. Opt. Soc. Am. A31(12), B10-B18 (2014).
23.X.Wu, S. Liu,W. Lv, and E. Y. Lam, "Robust and efficient inverse mask synthesis with basis function representation," J.Opt. Soc. Am. A31(2), B1-B9 (2014).
24.X.Wu, S. Liu,J. Li, and E. Y. Lam, "Efficient source mask optimization with Zernike polynomial functions for source representation,"Opt.Express 22(4), 3924-3937 (2014).
Leading Talents of Middle-aged and Young Scientific and Technological Innovation
Head of Innovation Group for Natural Science Foundation of Hubei Province
Winners of Program for New Century Excellent Talents in University
Top Ten Young Teacher of HUST
The Geneva International Invention Gold Award
Engineering Testing Technology Foundation
Micro - nano Testing Technology
Introduction to Ellipsometry