Academic Areas: nanoscale and optical metrology
Chuanwei Zhang received his BE and ME in Mechanical Engineering from Wuhan University in 2004 and 2006 respectively, and then received his PhD in Mechanical Engineering from Huazhong University of Science and Technology in 2009. After two years of postdoctoral research, he is currently working as a assistant professor on optical techniques for critical dimension, overlay, and 3D profile metrology in nanomanufacturing. He holds 16 patents and has authored or co-authored more than 20 papers.
2000.9-2004.6 Wuhan University BE
2004.9-2006.6 Wuhan University ME
2006.9-2009.11 Huazhong University of Science and Technology PHD
2009.11-2011.11 Huazhong University of Science and Technology Postdoctor
2011.12-now Huazhong University of Science and Technology Assistant Professor
 Xu S, Zhang CW, Wei HQ, and Liu SY, A single-image method of aberration retrieval for imaging systems under partially coherent illumination, J. Opt. 16(7), 072001 ,2014.
 Chen XG, Zhang CW, Liu SY,，Accurate measurement of templates and imprinted grating structures using Mueller matrix ellipsometry, Acta Phys. Sin., 63(18): 180701, 2014.
 Chen XG, Zhang CW, Liu SY, Depolarization effects from nanoimprinted grating structures as measured by Mueller matrix polarimetry. APPLIED PHYSICS LETTERS, 103(15): 151605, 2013.
 Zhang CW, Liu SY, Shi TL, Tang ZR, Fitting-determined formulation of effective mediumapproximation for 3D trench structures in model-based infrared reflectrometry, JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A, 28(2): 263-271, 2011
 Zhang CW, Liu SY, Shi TL, Tang ZR, Improved model-based infrared reflectrometry for measuring deep trench structures, JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A, 26(11): 2327-2335, 2009
 Chen XG, Liu SY, Zhang CW, Jiang H, Improved measurement accuracy in optical scatterometry using correction-based library search. APPLIED OPTICS, 52(27): 6727-6734, 2013.
 Chen XG, Liu SY, Zhang CW, Jiang H, Measurement configuration optimization for accurate grating reconstruction by Mueller matrix polarimetry. JOURNAL OF MICRO/NANOLITTHGRAPHY, MEMS, AND MOEMS, 12(3): 033013, 2013.
 Chen XG, Liu SY, Zhang CW, Zhu JL, Improved measurement accuracy in optical scatterometry using fitting error interpolation based library search, MEASUREMET, 46(8): 2638-2646, 2013.
 Zhu JL, Liu SY, Zhang CW, Chen XG, Dong ZQ, Identification and reconstruction of diffraction structures in optical scatterometry using support vector machine method, JOURNAL OF MICRO/NANOLITHOGRAPHY, MEMS, AND MOEMS, 12(1): 013004, 2013
 Liu SY, Ma Y, Chen XG, Zhang CW, Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical critical dimension metrology, OPTICAL ENGINEERING, 51(8): 081504, 2012
 Liu W, Liu SY, Wu XF, Zhang CW, Parametric analytical model for off-axis illumination sources based on Sigmoid function, ACTA PHYSICA SINICA, 60(5): 054213, 2011
 Liu SY, Zhang CW, Shen HW, Gu HY, Model-based FTIR reflectometry measurement system for deep trench structures of DRAM, SPECTROSCOPY AND SPECTRAL ANALYSIS, 29(4): 935-939, 2009
 Liu SY, Gu HY, Zhang CW, Shen HW, A fast algorithm for reflectivity calculation of micro/nano deep trench structures by corrected effective medium approximation, ACTA PHYSICA SINICA, 57(9): 5996-6001, 2008
2013 second prize in the Teaching Competition of Huazhong University of Science and Technology
2014 first prize in the Teaching Competition of Huazhong University of Science and Technology
Measurement Techniques of Mechanic Engineering, Fundamentals of Software Technology, Analysis of Mechatronic Systems
1. Research on key techniques of spectroscopic-ellipsometry-on-a-chip，Innovation Fund of Huazhong University of Science and Technology，in process
2. Reseach on the measurement of sidewall profie of the trench structures with the infrared ellipsometry.，NSFC，finish