Selected Publications
1. X. Chen, H. Gu, H. Jiang, C. Zhang, and S. Liu, “Robust overlay metrology with differential Mueller matrix calculus,” Opt. Express 25(8), 8491-9510 (2017).
2. X. Chen, W. Du, K. Yuan, J. Chen, H. Jiang, C. Zhang, and S. Liu, “Development of a spectroscopic Mueller matrix imaging ellipsometer for nanostructure metrology,” Rev. Sci. Instrum. 87, 053707 (2016).
3. X. Chen, Y. Shi, H. Jiang, C. Zhang, and S. Liu, “Nondestructive analysis of lithographic patterns with natural line edge roughness from Mueller matrix ellipsometric data,” Appl. Surf. Sci. 388, 524-530 (2016).
4. X. Chen, H. Jiang, C. Zhang, and S. Liu, “Towards understanding the detection of profile asymmetry from Mueller matrix differential decomposition,” J. Appl. Phys. 118(22), 225308 (2015).
5. X. Chen, S. Liu, C. Zhang, H. Jiang, Z. Ma, T. Sun, and Z. Xu, “Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry,” Opt. Express 22(12), 15165-15177 (2014).
6. X. Chen, C. Zhang, S. Liu, H. Jiang, Z. Ma, and Z. Xu, “Mueller matrix ellipsometric detection of profile asymmetry in nanoimprinted grating structures,” J. Appl. Phys. 116(19), 194305 (2014).
7. X. Chen, S. Liu, H. Gu, and C. Zhang, “Formulation of error propagation and estimation in grating reconstruction by a dual-rotating compensator Mueller matrix polarimeter,” Thin Solid Films 571, 653-659 (2014).
8. X. Chen, C. Zhang, and S. Liu, “Depolarization effects from nanoimprinted grating structures as measured by Mueller matrix polarimetry,” Appl. Phys. Lett. 103(15), 151605 (2013).
9. X. Chen, S. Liu, C. Zhang, and H. Jiang, “Improved measurement accuracy in optical scatterometry using correction-based library search,” Appl. Opt. 52(27), 6727-6734 (2013).
