The Second Area Selective Deposition workshop (ASD 2017) was held in Eindhoven, Holland from April 20 to April 21. Professor Chen Rong was invited to attend this conference and made a presentation named “Design And Synthesis of Catalytic Nanoparticles via Area Selective Atomic Layer Deposition”.
Firstly she pointed out that it was vital to design catalysts for optimized activity, stability and selectivity. Subsequently she addressed that ALD can be used to design catalysts and that area-selective processes provide several opportunities. Area-selective ALD processes can be used to prepare core-shell bimetallic catalysts of noble metals with regular ALD recipes. A similar thing can be done by SAMs (K. Cao et al., Sci. Rep. 5,8470,2015) while SAMs can also be used to block ALD growth on noble metal particles, so that it is possible to tailor the surface of the metal oxide support material. In this way, basically Co3O4 can deposite around Pt nanoparticles as a sort of nanotrap which greatly enhanced the thermal stability of the Pt nanoparticles (X. Liu et al., Angew. Chem. 129,1670,2017).
Furthermore, she presented the concept of facet-selective ALD, i.e. ALD growth that is only obtained at specific facets of the particle. Instead of relying on the surface material, such an ALD process is even selective to the crystal orientation. Recent research indicated that Facet-selective ALD of CeO2 can be used to generate nanofence coatings on Pt nanoparticles.
From the results shown, it can be concluded that selective ALD is a powerful synthesis method to create model catalysts
This project was funded by International Cooperation Promotion Plan of MSE.
