From 18 to 24 Oct. 2015, Professor Shiyuan Liu and Associate Professor Hao Jiang went to San Jose, USA, to attend the AVS 62nd International Symposium and Exhibition. In the Symposium, Hao Jiang gave an oral presentation named “Characterization of curved surface layer using Mueller matrix ellipsometry”. Prof. Liu presented at the Symposium as the Committee Member of the Spectroscopic ellipsometry Program.
In the symposium, Dr. Hao Jiang reported the latest advances on characterization of curved surface layer using Mueller matrix ellipsometry (MME). In his presentation, Dr. Jiang introduced the requirement of the single crystal silicon sphere measurement in the International Avogadro Coordination (IAC) project; evaluated the influence of the planar surface assumption and the inevitable offset between the detected spot and the surface vertex in the characterization of curved surface layer; and proposed an access to a higher measurement accuracy with consideration of the surface geometry characteristics and the optical anisotropy obtained in MME measurement. The experimental results show that not only the accuracy of thickness measurement can be improved, but also the curvature radius of a sphere crown can be directly determined with the proposed method. The research attracted the wide attention and interest of the participants.
The AVS International Symposium and Exhibition, which is organized by the American Vacuum Society, cover multiple research areas such as surface science, biological materials, electronic materials, manufacturing science and technology, Nano science and technology, thin film science, metrology and characterization, etc., and attracted more than 2,000 experts, scholars and researchers around the world. During the symposium, Prof. Liu and Dr. Jiang made extensive exchanges with the participants, and were invited to visit the University of California at Berkeley.
The visit was supported by the international cooperation promoting program funds of MSE.
