OCT 28- NOV 4, 2017, Dr. Rong Chen, a professor in state key laboratory of digital manufacturing equipment and technology of HUST attended AVS 64th International symposium and exhibition held in the city of Tampa, Florida, USA. At the symposium, Professor Rong Chen delivered an invited oral presentation titled Area Selective Atomic Layer Deposition (ALD) via Precursor Selective Adsorption: Theory, Strategy, and Applications in Catalysis, where the effect of adsorption energy of precursors on area-selective ALD of metal oxides was demonstrated clearly. The presentation attracted great interests.
The meeting aimed to provide professional interactions in the areas of advanced manufacturing, advanced materials and so on, and it provided the participants with chances to communicate face to face. The meeting covered the areas of vacuum science, micro-nano manufacturing, advanced characterization, etc. Topics involved in the meeting included thin film technology, ALD and its applications, plasma technology, catalysis and so on. During the symposium, Prof. Chen interchanged deeply with other scientists on development of ALD technology.
