Nov 5-11, 2017, Dr. Rong Chen, a professor in state key laboratory of digital manufacturing equipment and technology of HUST attended the 4th International Symposium on Hybrid Materials and Processing in Busan, Korea. At the symposium, Prof. Chen delivered an invited oral presentation titled Design and Synthesis of Catalytic Interfaces via Selective Atomic Layer Deposition (ALD), which clarified how to design the high-efficient hybrid catalyst using area-selective ALD. The presentation attracted great interests.
The meeting aimed to provide professional interactions in the areas related to material design and processing, where participants are able to communicate on-site. The themes discussed at the meeting were mainly on new materials, hybrid materials and interface materials etc. Thus, a wide range of disciplines such as surface chemistry, computational material science and material processing was involved in the discussions. Besides giving a presentation, Prof. Chen interchanged deeply with other scientists on development of ALD technology.