From November 19th to November 23rd, 2024, the 36th Annual Meeting of ISO/TC 107 (Metallic and Other Inorganic Coatings) hosted by Shimadzu Corporation was successfully held in Kyoto, Japan. Professor Chen Rong from our institute led a delegation to participate in the meeting. Together with nearly 100 delegates, experts, and committee members from countries such as South Korea, Japan, Germany, the United Kingdom, Finland, and others, they engaged in extensive discussions on the progress of standards and newly proposed standards.
On November 21st, Professor Chen Rong, as the Convenor of ISO/TC 107/WG 5 Atomic Layer Deposition Working Group, reviewed the work of the Atomic Layer Deposition Working Group Committee over the past year during the WG 5 subcommittee meeting. Currently, the team has completed and published one international standard titled "Terminology for Atomic Layer Deposition" and is in the process of formulating two draft standards related to selective atomic layer deposition in semiconductors and applications in solar cells. Associate Professor Liu Xiao presented a proposal report on the new standard "Coating rate of powder atomic layer deposition – Specification and test methods" at the working group meeting, which received positive feedback from experts and was recommended for inclusion in the next step of the process. Associate Professors Cao Kun and Yang Fan also actively participated in relevant discussions during the WG 5 Atomic Layer Deposition Working Group meeting.
On November 22nd, the WG 5 subcommittee proposed to ISO/TC 107, and the ISO/TC 107 General Assembly approved a resolution to further advance the international standard projects on ongoing and new proposals related to atomic layer deposition. Additionally, it was decided that the 37th Annual Meeting of ISO/TC 107 on Metallic and Other Inorganic Coatings, along with the 4th Meeting of WG 5 Atomic Layer Deposition Working Group, will be held in Wuhan in 2025.
